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The following are the links to the MSDS's of the chemicals used in the CIRFE Facility.
 | Note to User Please let the CIRFE manager know if there are any errors or omissions on this page |
Accuglass(R) Spin-On Glass
Acetic Acid
Acetone
Aluminum Metal
Aluminum Magnesium Silicate
Aluminum Oxide
Ammonia
Ammonium Fluoride
Ammonium Hydroxide
Argon
AZ300 MIF
AZ 3312-F Photoresist
AZ 3330 Photoresist
AZ 3330-F Photoresist
AZ Kwik Strip
AZ nLOF 2035
Boron Nitride
Carbon
Chromium Etch 1020
Chromium Etch CRE-473
Chromium Trioxide
Chromium
Copper Etchant Type 100/200
CRE-473 Chromium Etch
Cyclotene 3022-46 Electronics Resin
Decon-Glass
EKC265
Electroless Nickel Part A
Electroless Nickel Part B
Electroless Nickel Part C
EPO-TEK H20E
Ethylene Glycol
Gold Etchant TFA
Halocarbon 14
Halocarbon 23
Helium
Hydrochloric Acid
Hydrofluoric Acid
Hydrogen Peroxide
Iso-Propyl Alcohol
Liquid Nitrogen
LOR A Series Resists
Molybdenum
NANO Remover PG
Negative Resist NR1-3000PY
Nickel
Niobium
Nitric Acid
Nitrogen
Nitrous Oxide
Oxalic Acid Dihydrate
Oxygen
Pad Etch 4
PD523AD
Phosphoric Acid
Polyimide Coating PI-2562
Polyimide Coating PI-2611
Potassium Hydroxide Pellets
PSE-200
Resist Developer RD6
Resist Remover RR2
Silane
Sodium Carbonate
Solution Polymer 41E
Steel-Bright
SU-8 2000 Series Resists
SU-8 Developer
Sulfur Hexafluoride
Sulfuric Acid
THB151N
Titanium Dioxide
Titanium-Tungsten Etchant TiW-30
TMAH, 25%
Toluene
Tungsten
VM651
Zincate